Multilayer h-BN (Boron Nitride) film grown in copper foil.
Catalog Number
ACMA00020978
Description
h-BN has an even higher chemical stability than graphene; it can be stable in air up to 1000 °C (in contrast, for graphene the corresponding temperature is 600 °C). During Chemical Vapor Deposition, BN is grown on both sides of the copper foil.
Solubility
H₂O: 5 mg/mL
Application
Electrocatalyst. Field-effect transistors. Sensors. Lithium ion batteries. Supercapacitors.
Assay
>80% carbon basis
Bandgap
5.97 eV
Copper Foil Thickness
20 microns
Coverage
90-95%
Form
powder
Functionalization
PEG
Impurities
4-5% trace metals
Quality Level
100
Thickness
13 nm
Weight
0.10 lbs
Our products are for research use only and cannot be used for any clinical purposes.
