Single layer h-BN (Boron Nitride) film grown on copper foil: 2" x 1"
Catalog Number
ACMA00020979
Product Name
Single layer h-BN (Boron Nitride) film grown on copper foil: 2" x 1"
Description
h-BN has an even higher chemical stability than graphene; it can be stable in air up to 1000 °C (in contrast, for graphene the corresponding temperature is 600 °C). During Chemical Vapor Deposition, BN is grown on both sides of the copper foil.
Density
1.7-1.9 g/cm³ at 25 °C (lit.)
Application
Electrocatalyst. Field-effect transistors. Sensors. Lithium ion batteries. Supercapacitors.
Assay
≥98% carbon basis
Bandgap
5.97 eV
Color
black
Copper Foil Thickness
25 μm thick
Coverage
90-95%
Dimension
3-5 nm
Form
powder or flakes
Impurity Content
500 ppm Fe (max)
Quality Level
100
Size
2" x 1"
Surface Area
spec. surface area 800-1000 m2/g (by BET)
Weight
0.10 lbs
Our products are for research use only and cannot be used for any clinical purposes.
