Description
Graphene preparation method: electrochemical exfoliation.
• Graphene thickness by AFM: ∼80% 1-3 layers.• Sheet size by AFM: 5-10 μm.• Oxygen content: 5.5 at.% (C/O-ratio: 17.2).
• Raman I_D/I_G ratio: 0.25.
• Sheet resistance: 2 kΩ/sq.
• Typical properties of films produced thereof (after dilution to 0.1 mg/mL and dry transfer from PTFE-filter):
6 nm film: 91% transmittance, sheet resistance of 24.2 kΩ/sq (as made), 7.9 kΩ/sq (after 30 min, 200 °C), <1 kΩ/sq (conc. HNO3-treatment).16 nm film: 73% transmittance, sheet resistance of 7.6 kΩ/sq (as made), 1.8 kΩ/sq (after 30 min, 200 °C), <500 Ω/sq (conc. HNO3-treatment).